Wax Deposition Processes using Small Benchtop Deposition Devices- A Computational Approach

Klaus Weispfennig¹ and G. Dale Wesson²

¹Baker Petrolite, Sugar Land, TX; ²Florida A&M University, Tallahassee, FL

Wax deposition in pipelines is a constant concern for operators inasmuch as it may partially or totally block production lines and thus cause production to decrease or halt. As oil and gas production moves to deeper water, pipeline blockage remediation becomes more and more expensive. Therefore, a thorough understanding of the wax deposition process may identify potential risks and help in the design and operation of production systems.

The ability to predict wax deposition within these flow lines and/or flow loops still poses several important questions, one of which may address the impact on shear stress on the overall growth of the deposit. Furthermore, if small benchtop devices are used to simulate wax deposition processes, the influences of the particular flow fields within these devices may affect the deposition process, especially if the flow field used for the simulations rotates.

This research addresses these issues in order to gain a better understanding of the wax deposition process and to aid in the analysis of data thus acquired. Computational fluid dynamics is used at times to support these assessments where necessary and relevant. Results from the computational and conceptual studies may be used to design suitable laboratory experiments and help in the scaling process when these results are to be applied to flow lines.